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由MForsberg著作·2004·被引用6次—Deeptrenches,usuallywithadepthlargerthanacoupleofmicrometers,aremainlyusedtoisolatedifferentdevicesanddevicegroups(wells)inCMOS/.BiCMOS ...,Theexperimentshowsthatdeeptrenchtechnologyiscapabletopromotetheperformanceo...
Deep trench isolation structure and method of forming same
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Deeptrenchisolation(DTI)structuresandmethodsofformingthesameareprovided.Amethodincludesformingapluralityofphotosensitiveregionsina ...
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